The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2009

Filed:

Aug. 04, 2006
Applicant:

Sipke Wadman, Waalre, NL;

Inventor:

Sipke Wadman, Waalre, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G01J 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A parousiameter having a dual beam setup and method for use thereof is provided for producing measurements of optical parameters. The dual beam parousiameter includes a hemispherical dome enclosuresealed at the bottom with a base. A radiation sourceproduces radiation in two beams, an illumination beamfor illuminating a sample surfaceand a calibration beamfor providing optical characterization information about the illumination beam. Each beam is guided into the hemispherical dome enclosurevia separate optical paths. An optical imaging deviceis positioned to acquire an image of scatter radiationscattered by the sample surfaceilluminated by the illumination beam, and acquire an image of the calibration beam, simultaneously. The calibration beam image is used to compensate for variability in optical output of the radiation sourcewhen analyzing the scatter radiation data.


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