The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2009
Filed:
Oct. 04, 2006
Applicants:
Sung-gun Kang, Gyeonggi-do, KR;
Jin-mo Kang, Gyeonggi-do, KR;
Jae-ho Lee, Gyeonggi-do, KR;
Jun-seop Lee, Gyeonggi-do, KR;
Inventors:
Sung-Gun Kang, Gyeonggi-do, KR;
Jin-Mo Kang, Gyeonggi-do, KR;
Jae-Ho Lee, Gyeonggi-do, KR;
Jun-Seop Lee, Gyeonggi-do, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are selected among the photo resist patterns. The inferior patterns are eliminated or shrunken by irradiating the selected inferior patterns with an electron beam.