The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Apr. 12, 2005
Koji Shimazawa, Tokyo, JP;
Kosuke Tanaka, Tokyo, JP;
Tomoaki Shimizu, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
Both end portions of a magneto-resistive effect film form a junction taper shape and, at both end portions forming the junction taper shape, a pair of bias magnetic field applying layers are disposed via underlayers for applying a longitudinal bias magnetic field to a soft magnetic layer. Each of the underlayers is formed by a thin film made of at least one element selected from a group of Ru, Ti, Zr, Hf, and Zn or an alloy thin film containing, as a main component, at least one element selected from the group. Each of the bias magnetic field applying layers formed on the underlayers is formed by a hard magnetic layer and has a thickness of 200 Å or less (not including zero).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile