The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2009

Filed:

Nov. 09, 2006
Applicants:

Michael W. Stowell, Loveland, CO (US);

Guenter Klemm, Nidda, DE;

Hans-georg Lotz, Gründau-Rothenbergen, DE;

Volker Hacker, Altenstadt, DE;

Inventors:

Michael W. Stowell, Loveland, CO (US);

Guenter Klemm, Nidda, DE;

Hans-Georg Lotz, Gründau-Rothenbergen, DE;

Volker Hacker, Altenstadt, DE;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 13/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.


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