The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Dec. 13, 2005
Masayuki Jyumonji, Yokohama, JP;
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Kamakura, JP;
Masato Hiramatsu, Tokyo, JP;
Yoshio Takami, Yokohama, JP;
Masayuki Jyumonji, Yokohama, JP;
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Kamakura, JP;
Masato Hiramatsu, Tokyo, JP;
Yoshio Takami, Yokohama, JP;
Advanced LCD Technologies Development Center Co., Ltd., Yokohama-shi, JP;
Abstract
A laser anneal apparatus is provided with a laser source; a homogenizing optical system disposed in an optical path of laser light emitted from the laser source to homogenize an intensity distribution of the laser light in a section which is perpendicular to the optical path; a phase shifter disposed in the optical path of the laser light passed through the homogenizing optical system to produce an intensity distribution pattern of the laser light in the section which is perpendicular to the optical path; a photoreceptor device disposed in the optical path of the laser light passed through the phase shifter to intercept a part of the laser light and to measure a quantity of the intercepted laser light; and an image-forming optical system disposed in the optical path of the laser light passed through the photoreceptor device to focus the laser light on a substrate to be treated.