The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
May. 09, 2007
Yoko Takebe, Yokohama, JP;
Isamu Kaneko, Yokohama, JP;
Yoko Takebe, Yokohama, JP;
Isamu Kaneko, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):CF═CFCHCH-Q-CHCH═CH  (1)wherein Q is (CH)C(CF)OR(wherein a is an integer of from 0 to 3, Ris an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CHR(wherein Ris an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH)COOR(wherein d is 0 or 1, and Ris a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.