The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2009

Filed:

Dec. 12, 2005
Applicants:

Sang Jin Han, Suwon, KR;

Sung Ho Lee, Yongin, KR;

Myung Soo Huh, Suwon, KR;

Seok Heon Jeong, Yongin, KR;

Kwan Seop Song, Suwon, KR;

Hee Cheol Kang, Suwon, KR;

Inventors:

Sang Jin Han, Suwon, KR;

Sung Ho Lee, Yongin, KR;

Myung Soo Huh, Suwon, KR;

Seok Heon Jeong, Yongin, KR;

Kwan Seop Song, Suwon, KR;

Hee Cheol Kang, Suwon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01); G03B 27/52 (2006.01); C23C 14/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.


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