The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Sep. 08, 2005
Applicants:
Hongzhi Kong, Shanghai, CN;
Qin Sun, Kokomo, IN (US);
Inventors:
Hongzhi Kong, Shanghai, CN;
Qin Sun, Kokomo, IN (US);
Assignee:
Delphi Technologies, Inc., Troy, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/238 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of exposure control for an imaging system. A predetermined number of images are captured by one or more imagers, wherein the images are defined by an image resolution matrix. The images are masked to establish a region of interest within the image resolution matrix and brightness of the images is analyzed within the region of interest. An exposure time is calculated for a subsequent image capturing step based on the brightness analysis, and an exposure time setting of the imager(s) is adjusted during the subsequent image capturing step based on the calculated exposure time.