The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Oct. 05, 2005
Robert R Mcelvain, Kingwood, TX (US);
John D Hottovy, Humble, TX (US);
David H. Burns, Houston, TX (US);
Donald W. Verser, Houston, TX (US);
Anurag Gupta, Sugarland, TX (US);
Ralph W. Romig, Kingwood, TX (US);
Robert R McElvain, Kingwood, TX (US);
John D Hottovy, Humble, TX (US);
David H. Burns, Houston, TX (US);
Donald W. Verser, Houston, TX (US);
Anurag Gupta, Sugarland, TX (US);
Ralph W. Romig, Kingwood, TX (US);
Chevron Phillips Chemical Company LP, The Woodlands, TX (US);
Abstract
An apparatus and method for removing polymer solids from a slurry loop reactor. A discharge conduit having a longitudinal axis and an end section for removing polymer solids from the slurry loop reactor is provided. The discharge conduit is attached to the slurry loop reactor so that the longitudinal axis and at least a portion of an outer wall of the slurry loop reactor form an angle of less than about 90 degrees. The end section includes a first edge and a second edge that extends past at least a portion of an inner wall of the slurry loop reactor into a liquid reactor slurry. Polymer solids contained within the liquid reactor slurry are concentrated on the second edge so that an average polymer solids concentration in the discharge slurry is greater than an average polymer solids concentration of the liquid reactor slurry within the slurry loop reactor.