The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Aug. 31, 2005
Shosei Mori, Hiratsuka, JP;
Tsuyoshi Furuse, Isehara, JP;
Masahiro Terada, Hadano, JP;
Takeru Mizue, Atsugi, JP;
Kazuhiro Kagami, Atsugi, JP;
Shosei Mori, Hiratsuka, JP;
Tsuyoshi Furuse, Isehara, JP;
Masahiro Terada, Hadano, JP;
Takeru Mizue, Atsugi, JP;
Kazuhiro Kagami, Atsugi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for producing a film pattern comprises a step of forming a resin film on a substrate surface; a step of incorporating into the resin film a constituent of a conductive film or a semiconductor film; a step of irradiating the resin film with an ultraviolet light; and a step of heating the resin film at a temperature not lower than a decomposition temperature of the resin to form a conductive film or a semiconductor film on the substrate, whereby the resin does not easily generate decomposition residues to improve precision and quality of the produced film pattern.