The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Jul. 07, 2005
Shou-ren Chen, Hsinchu, TW;
Chuan-feng Chen, Hsinchu, TW;
Yu-lun Ho, Hsinchu, TW;
Jen-hua Wu, Hsinchu, TW;
Wei-han Wang, Hsinchu, TW;
Lai-sheng Chen, Hsinchu, TW;
Shou-Ren Chen, Hsinchu, TW;
Chuan-Feng Chen, Hsinchu, TW;
Yu-Lun Ho, Hsinchu, TW;
Jen-Hua Wu, Hsinchu, TW;
Wei-Han Wang, Hsinchu, TW;
Lai-Sheng Chen, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu Hsien, TW;
Abstract
A microimprint/nanoimprint uniform pressing apparatus is used to provide uniform imprinting pressure to a molding material layer between a substrate and a mold. The uniform pressing apparatus includes a uniform pressing unit for being directly in contact with the mold or the substrate, so as to allow each point to have equal pressure during imprinting and utilize a simple structure to transmit uniform imprinting pressure.