The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2009
Filed:
Aug. 30, 2005
Takeo Yoshioka, Nakakoma-gun, JP;
Yoshiyuki Honjo, Nakakoma-gun, JP;
Shigeo Watanabe, Nakakoma-gun, JP;
Takeo Yoshioka, Nakakoma-gun, JP;
Yoshiyuki Honjo, Nakakoma-gun, JP;
Shigeo Watanabe, Nakakoma-gun, JP;
THK Co., Ltd., Tokyo, JP;
Abstract
A condition detection apparatus comprising an AE sensorthat detects AE waves, which elastically-occur when a plurality of balls included in an LM system self-rotate and revolve within a circulation section at the same time, and generates detection signals Sae, and a signal processing unitthat generates a first parameter indicating an intensity of the AE waves based on the generated detection signals Sae, generates based on the detection signals Sae a second parameter by weighting only detection signals Sae temporally-continuously detected among the detection signals Sae, generates based on the detection signals Sae a third parameter by weighting only detection signals Sae temporally-discontinuously detected in correspondence with the movement of the balls among the detection signals Sae, and judges contents of an operational condition of the LM system using any one of the first, second or third parameter, is provided to enable prognosis of occurrences of failures in the LM system, to improve maintainability for a user of the LM system, and to contribute to the prolonging of the operation life of the LM system as well as performance assurance and quality improvement of apparatuses or devices incorporated with the LM system.