The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2009

Filed:

Oct. 19, 2006
Applicant:

Gregory David U'ren, Berkeley, CA (US);

Inventor:

Gregory David U'Ren, Berkeley, CA (US);

Assignee:

Qualcomm Mems Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a microelectromechanical systems (MEMS) device and method of manufacturing the same. MEMS such as an interferometric modulator include a sidewall spacer formed adjacent to a movable mirror. The sidewall spacer may be a sacrificial spacer that is removed during fabrication, or it may remain in the final product. Increased clearance is provided between the movable mirror and a support structure during actuation of the movable mirror, thereby avoiding contact during operation of the interferometric modulator. The deformable layer may be deposited in a more continuous fashion over the contour of a lower layer as determined by the contour of the sidewall spacer, resulting in a stronger and more resilient deformable layer.


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