The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2009

Filed:

Mar. 30, 2006
Applicants:

Lowell Scott Smith, Niskayuna, NY (US);

David Martin Mills, Niskayuna, NY (US);

Jeffrey Bernard Fortin, Niskayuna, NY (US);

Wei-cheng Tian, Clifton Park, NY (US);

John Robert Logan, Danville, CA (US);

Inventors:

Lowell Scott Smith, Niskayuna, NY (US);

David Martin Mills, Niskayuna, NY (US);

Jeffrey Bernard Fortin, Niskayuna, NY (US);

Wei-Cheng Tian, Clifton Park, NY (US);

John Robert Logan, Danville, CA (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/82 (2006.01); H01L 41/02 (2006.01); H04R 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A capacitive micromachined ultrasound transducer (cMUT) cell is presented. The cMUT cell includes a lower electrode. Furthermore, the cMUT cell includes a diaphragm disposed adjacent to the lower electrode such that a gap having a first gap width is formed between the diaphragm and the lower electrode, wherein the diaphragm comprises one of a first epitaxial layer or a first polysilicon layer. In addition, a stress reducing material is disposed in the first epitaxial layer.


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