The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2009

Filed:

Feb. 08, 2007
Applicants:

Cécile Aulnette, Grenoble, FR;

Christophe Figuet, Crolles, FR;

Inventors:

Cécile Aulnette, Grenoble, FR;

Christophe Figuet, Crolles, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor heterostructure that includes a support substrate with a first in-plane lattice parameter, a buffer structure formed on the support substrate and having on top in a relaxed state a second in-plane lattice parameter, and a multi-layer stack of ungraded layers formed on the buffer structure. This semiconductor hetero-structure possess a lower surface roughness than other heterostructures. In the heterostructure, the ungraded layers are strained layers that comprise at least one strained smoothing layer of a semiconductor material having in a relaxed state a third in-plane lattice parameter which has a value between the first and the second lattice parameter.


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