The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2009
Filed:
Feb. 14, 2007
Nao Yokota, Saunderstown, RI (US);
Arron Carroll, Warwick, RI (US);
Hiroshi Furuya, Narragansett, RI (US);
Hideo Yanase, West Warwick, RI (US);
Terufumi Takayama, Anpachi-Gun, JP;
Steven Sargeant, Kingston, RI (US);
Nao Yokota, Saunderstown, RI (US);
Arron Carroll, Warwick, RI (US);
Hiroshi Furuya, Narragansett, RI (US);
Hideo Yanase, West Warwick, RI (US);
Terufumi Takayama, Anpachi-Gun, JP;
Steven Sargeant, Kingston, RI (US);
Toray Plastics (America), Inc., , RI (US);
Abstract
Described are smooth biaxially oriented films and methods of making smooth biaxially oriented films for molding processes. The films may include an outer film layer A, and an outer film layer B that includes particles. Layer A has a SRa roughness of from 1 nm to 5 nm and a SRz roughness of from 10 nm to 100 nm. Layer B has a SRa roughness of from 5 nm to 50 nm and a SRz roughness of from 10 nm to 200 nm. The SRa and SRz of layer B is larger than the SRa and SRz of layer A.