The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2009

Filed:

Mar. 28, 2007
Applicant:

Kevin W. Mccullen, Essex Junction, VT (US);

Inventor:

Kevin W. McCullen, Essex Junction, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method, system and program product for migrating an integrated circuit (IC) layout for, for example, alternating aperture phase shift masks (AltPSM), are disclosed. In order to migrate a layout to phase compliance, jogs are identified on a first (AltPSM) layer and shifted to another second layer. Isolated or clustered jogs are shifted into an open channel portions on the second layer where possible. Remaining clustered jogs are shifted into as few new channels as possible on the second layer. The jog removal process leaves unidirectional wires that can be trivially phase colored. Standard technology migration techniques are then used to legalize the results on the layers.


Find Patent Forward Citations

Loading…