The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2009

Filed:

Jan. 26, 2006
Applicants:

Yasuhiko Kawaguchi, Nagoya, JP;

Atsuya Hayakawa, Chita, JP;

Hirokazu Nakashima, Nishikasugai-gun, JP;

Inventors:

Yasuhiko Kawaguchi, Nagoya, JP;

Atsuya Hayakawa, Chita, JP;

Hirokazu Nakashima, Nishikasugai-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D05C 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A complex data processing device that processes embroidery data representing an embroidery pattern to be formed on fabric by a sewing machine capable of embroidering and print data representing print pattern to be printed on the fabric by a printer. The complex data processing device includes a data acquiring unit that acquires the embroidery data and the print data, an overlapped region detecting unit that detects an overlapped region at which an embroidery region represented by the embroidery data and a printing region represented by the print data overlap based on the embroidery data and the print data acquired by the data acquiring unit, and a data modifying unit that deletes data corresponding to the overlapped region detected by the overlapped region detecting unit from at least one of the embroidery data and the print data.


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