The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2009

Filed:

Mar. 30, 2006
Applicant:

Fung-hsu Wu, Tao-Yuan Hsien, TW;

Inventor:

Fung-Hsu Wu, Tao-Yuan Hsien, TW;

Assignee:

Daxon Technology Inc., Gueishan, Tao-Yuan Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method capable of detecting spherical aberration caused by a storage medium includes generating a plurality of light beams having distinct phases by diffracting light emitted from a light source using a diffractive optical element, measuring optical signals of the plurality of light beams having distinct phases after being reflected by the storage medium, measuring optical signals of the plurality of light beams having distinct phases after being reflected by a reflective mirror, and updating settings of an adjusting device disposed on an optical path between the diffractive optical element and the storage medium in order to compensate for the spherical aberration caused by the storage medium.


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