The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2009

Filed:

Feb. 17, 2003
Applicants:

Mineyuki Hattori, Ibaraki, JP;

Takashi Hiraga, Osaka, JP;

Morio Murayama, Kanagawa, JP;

Inventors:

Mineyuki Hattori, Ibaraki, JP;

Takashi Hiraga, Osaka, JP;

Morio Murayama, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device which can produce polarized rare gas further improved in polarization rate with the gas kept flowing, which has flat sheet surfaces facing each other via a gap, and which comprises, a flat-surface flow cell unit for allowing a mixture gas of rare gas and optically-pumping catalyst to flow in the gap there through in one direction thereof, a laser beam irradiation unit for applying a laser beam toward at least one of the flat sheet surfaces to apply an excitation light into the flat-surface flow cell unit, and a magnetic field application unit for allowing a magnetic line of force to pass through the laser beam-applied flat sheet surface perpendicularly or almost perpendicularly; and a method using this device.


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