The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2009

Filed:

Apr. 21, 2008
Applicants:

Massimo Martinelli, Santa Clara, CA (US);

Long Yang, Union City, CA (US);

Mark H. Garrett, Morgan Hill, CA (US);

Robert Ostrom, Fremont, CA (US);

Joseph E. Davis, Morgan Hill, CA (US);

Inventors:

Massimo Martinelli, Santa Clara, CA (US);

Long Yang, Union City, CA (US);

Mark H. Garrett, Morgan Hill, CA (US);

Robert Ostrom, Fremont, CA (US);

Joseph E. Davis, Morgan Hill, CA (US);

Assignee:

Capella Photonics, Inc., San Jose, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A micromirror for use in an optical apparatus may comprise a reflective portion, configured to be rotatable about a switching axis and an attenuation axis that is different from the switching axis. The reflective portion may include an edge that is substantially parallel to the attenuation axis. The edge may include one or more edge features that protrude above a plane of the micromirror surface and/or are submerged below the plane of the micromirror surface, and/or have an edge shape that deviates from a straight line. Alternatively, an array of micromirrors may have mirrors characterized by sawtooth features disposed along edges that are substantially parallel to the attenuation axis.


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