The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Apr. 30, 2004
Applicants:
Savas Gider, San Jose, CA (US);
Wen-chien David Hsiao, San Jose, CA (US);
Inventors:
Savas Gider, San Jose, CA (US);
Wen-chien David Hsiao, San Jose, CA (US);
Assignee:
Hitachi Global Storage Technologies B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/187 (2006.01); G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for providing improved flux focusing in a write head is disclosed. The present invention uses a diamagnetic material to provide flux focusing in a storage device. An embodiment of the present invention includes diamagnetic material having a magnetic susceptibility substantially equal to or greater than 1×10. Another embodiment of the present invention includes diamagnetic material selected from a group comprising graphite and bismuth.