The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Oct. 09, 2007
Hiroshi Endo, Utsunomiya, JP;
Hiroshi Endo, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A photographing optical system includes at least one of a positive lens and diffractive optical element being provided closer to an object side of the system than an intersection P of a light axis and paraxial chief ray, and a negative lens, provided closer to an image side than the intersection. The positive lens and the negative lens are formed of materials satisfying the following conditions when the maximum height of a paraxial marginal ray, passing through a lens surface, from the light axis at a location closer to the object side than the intersection is greater than a maximum height of the paraxial marginal ray, passing through a lens surface, from the light axis at a location closer to the image than the intersection:−0.0015 ×+0.6425 <θgF60 <νwhere νd is an Abbe number and θgF is a partial dispersion ratio.