The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Mar. 21, 2006
Applicants:
Masashi Nishiki, Miyazaki, JP;
Hisashi Okada, Miyakonojo, JP;
Inventors:
Masashi Nishiki, Miyazaki, JP;
Hisashi Okada, Miyakonojo, JP;
Assignee:
Fujitsu Hitachi Plasma Display Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03B 27/44 (2006.01); G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/62 (2006.01); G03B 27/32 (2006.01); H01L 21/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.