The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7538852 B1

PDF
Full Text
Expired
Date of Patent:
May. 26, 2009

Filed:

Mar. 21, 2007
Applicant:

Takahito Chibana, Utsunomiya, JP;

Inventor:

Takahito Chibana, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/54 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus includes a projection optical system for projecting a pattern of an original onto a substrate, a stage for holding the substrate, a cover for substantially surrounding an exposure light path, from an end portion of the projection optical system, at a side facing the stage, to the stage, a first supply port provided inside the cover, for supplying a purge gas into a space surrounded by the cover, and a first exhaust port provided in an end portion of the cover at a side facing the stage, for exhausting the gas.


Find Patent Forward Citations

Chibana, Takahito. (2009). Exposure apparatus and device manufacturing method (U.S. Patent No. 7538852). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7538852

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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