The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2009

Filed:

Jun. 08, 2005
Applicants:

Kun Zhou, Beijing, CN;

Yaohua HU, Beijing, CN;

Stephen S. Lin, Beijing, CN;

Baining Guo, Beijing, CN;

Heung-yeung Shum, Bellevue, WA (US);

Inventors:

Kun Zhou, Beijing, CN;

Yaohua Hu, Beijing, CN;

Stephen S. Lin, Beijing, CN;

Baining Guo, Beijing, CN;

Heung-Yeung Shum, Bellevue, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Pre-computed shadow fields are described. In one aspect, shadow fields for multiple entities are pre-computed. The shadow fields are pre-computed independent of scene configuration. The multiple entities include at least one occluding object and at least one light source. A pre-computed shadow field for a light source indicates radiance from the light source. A pre-computed shadow field for an occluding object indicates occlusion of radiance from the at least one light source.


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