The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Sep. 01, 2005
Shane Juhl, Dayton, OH (US);
Sergei F. Lyuksyutov, Akron, OH (US);
Richard A. Vaia, Beavercreek, OH (US);
Shane Juhl, Dayton, OH (US);
Sergei F. Lyuksyutov, Akron, OH (US);
Richard A. Vaia, Beavercreek, OH (US);
The United States of America as represented by the Secretary of the Air Force, Washington, DC (US);
Abstract
The method of the present invention utilizes atomic force microscopy techniques (AFM) for the reversible formation of nanoscale polymeric features by localized heating and mechanical deformation, generated through electrostatically mediated interactions across the polymer film between a conductive backplane and the cantilever AFM tip. This technique utilizes a selective lifting/placement of the cantilevered tip in the z direction (perpendicular to the planar surface of the polymer) to produce nanostructures of precise dimensions in contact AFM mode from regions of polymer locally heated by current flow between the cantilever AFM tip and the conductive substrate.