The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
May. 12, 2006
Ching-yu Chou, Hsinchu, TW;
Ching-Yu Chou, Hsinchu, TW;
ICF Technology Co., Ltd., Hsinchu, TW;
Abstract
A method for manufacturing a color filter includes the steps of: forming an organic black photoresist layer () on a transparent substrate (); exposing the organic black photoresist layer using a photo-mask; developing the organic black photoresist layer to form an organic black matrix () on the transparent substrate; forming a positive photoresist layer () on the transparent substrate thereby covering the organic black matrix with the positive photoresist layer; irradiating a surface of the transparent substrate facing away from the positive photoresist layer so as to expose the positive photoresist layer; developing the positive photoresist layer to form a plurality of banks () on the organic black matrix; injecting ink into spaces defined by the banks and the organic black matrix using an ink-jet device; and solidifying the ink.