The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Sep. 06, 2005
Young Jong Lee, Sungnam-shi, KR;
Jun Young Choi, Seoul, KR;
Hyun Hwan Ahn, Sungnam-shi, KR;
Chan-ho Kang, Yongin-shi, KR;
Hyun-woo Baek, Sungnam-shi, KR;
Young-joo Hwang, Seoul, KR;
Young Jong Lee, Sungnam-shi, KR;
Jun Young Choi, Seoul, KR;
Hyun Hwan Ahn, Sungnam-shi, KR;
Chan-Ho Kang, Yongin-shi, KR;
Hyun-Woo Baek, Sungnam-shi, KR;
Young-Joo Hwang, Seoul, KR;
Advanced Display Processing Engineering Co., Ltd., Sungnam-Shi, KR;
Abstract
Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.