The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Dec. 02, 2005
Applicants:
Kaaeid A. Lokhandwala, Fremont, CA (US);
Ankur Jariwala, Mountain View, CA (US);
Inventors:
Kaaeid A. Lokhandwala, Fremont, CA (US);
Ankur Jariwala, Mountain View, CA (US);
Assignee:
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); E21B 33/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process and equipment for treating natural gas produced by a well that has recently been stimulated, and that contains an undesirably high concentration of the fracturing gas used to stimulate the well. The process involves treating the gas by membrane separation, and provides for control of treatment parameters to compensate for the changing concentration of fracturing gas in the produced gas, as well as changes in gas flow rate.