The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Mar. 13, 2008
Noriko Saito, Tokyo, JP;
Akio Kobayashi, Tokyo, JP;
Hiroyuki Kawashima, Tokyo, JP;
Kabushiki Kaisha TOPCON, Tokyo, JP;
Abstract
A wavefront aberration compensating apparatus, which includes: a deformable mirror having electrodes and a thin-film mirror; an optical system provided with the deformable mirror and including an object; a wavefront sensor which measures a wavefront aberration of a light flux; and a controller configured to: calculate a first voltage value applied to each of the electrodes, on the basis of differences between application points on the thin-film mirror and target points both corresponding to the electrodes respectively; determine a superposition amplitude value of each expansion mode according to a polynomial of wavefront aberration, and calculate a second voltage value applied to each of the electrodes by using voltage templates previously stored, such that the wavefront aberration obtained by the wavefront sensor becomes a desired aberration; determine the voltage value applied to each of the electrodes, by mainly using the second voltage value in an initial stage of compensation of the configuration of the thin-film mirror and by mainly using the first voltage value in an end stage of the compensation; and repeat the compensation on the basis of the determined voltage value, such that the wavefront aberration of the light flux is suppressed.