The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2009

Filed:

Apr. 06, 2006
Applicants:

Sheng-nan LU, Shulin, TW;

Hsiang-chi Chien, Shulin, TW;

Chia-hsiang Chen, Shulin, TW;

Inventors:

Sheng-Nan Lu, Shulin, TW;

Hsiang-Chi Chien, Shulin, TW;

Chia-Hsiang Chen, Shulin, TW;

Assignee:

Shin Zu Shing Co., Ltd., Shulin, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E05D 11/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hinge includes a first sleeve and a second sleeve pivotally engaged with the first sleeve. The first sleeve has an arcuate step formed on an outer surface thereof, a neck extending from an outer surface of the arcuate step, at least one indentation formed on the arcuate step and a first upright wall formed on an end of the indentation. The second sleeve has at least one projection formed on an inner surface thereof to correspond to and be selectively received in the at least one indentation of the first sleeve so as to provide a positioning effect to the second sleeve when the at least one projection is received in the at least one indentation and a second upright wall formed on an end of the projection of the second sleeve to correspond to the first upright wall such that the first upright wall abutting the second upright wall is able to prevent excessive pivotal movement of the second sleeve relative to the first sleeve.


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