The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2009

Filed:

Feb. 28, 2006
Applicants:

Huisheng Liu, Sammamish, WA (US);

Nikolaj S. Bjorner, Woodinville, WA (US);

Guhan Suriyanarayanan, Redmond, WA (US);

Inventors:

Huisheng Liu, Sammamish, WA (US);

Nikolaj S. Bjorner, Woodinville, WA (US);

Guhan Suriyanarayanan, Redmond, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01); G06F 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Aspects of the subject matter described herein relate to resource replication systems. In aspects, a mechanism is described that maintains replicated resources on a slave member that participates in a replica group. The slave member detects that a local resource has been updated locally. If the resource was created locally in the update, the slave member deletes the local resource. Otherwise, the slave member determines an upstream partner from which to install a replacement resource and then installs the replacement resource. In aspects, this behavior undoes local updates to local resources that occur on the slave member.


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