The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2009

Filed:

Oct. 26, 2007
Applicants:

Kevin M. Koch, Waukesha, WI (US);

Richard Scott Hinks, Waukesha, WI (US);

David Thomas Gering, Waukesha, WI (US);

Inventors:

Kevin M. Koch, Waukesha, WI (US);

Richard Scott Hinks, Waukesha, WI (US);

David Thomas Gering, Waukesha, WI (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A technique for reconstructing a corrected MR image from MR images distorted by foreign object induced magnetic fields includes locating a foreign object in a subject and defining a localized area of a field of view about the foreign object where a magnetic field distortion adversely affects a first magnetic distortion correction technique. The first magnetic distortion correction technique is applied to the field of view other than in the localized area. A second magnetic distortion correction technique is applied to the localized area and the results of the application of the first and second magnetic distortion correction techniques are combined. An image is reconstructed based on the results of the application of the first and second magnetic distortion correction techniques.


Find Patent Forward Citations

Loading…