The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Oct. 14, 2005
Won-joo Kim, Suwon-si, KR;
Yoon-dong Park, Yongin-si, KR;
Eun-hong Lee, Anyang-si, KR;
Sun-ae Seo, Hwaseong-si, KR;
Sang-min Shin, Seoul, KR;
Jung-hoon Lee, Seoul, KR;
Seung-hyuk Chang, Seongnam-si, KR;
Won-joo Kim, Suwon-si, KR;
Yoon-dong Park, Yongin-si, KR;
Eun-hong Lee, Anyang-si, KR;
Sun-ae Seo, Hwaseong-si, KR;
Sang-min Shin, Seoul, KR;
Jung-hoon Lee, Seoul, KR;
Seung-hyuk Chang, Seongnam-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
A multi bits flash memory device and a method of operating the same are disclosed. The multi bits flash memory device includes: a stacked structure including: a first active layer with a mesa-like form disposed on a substrate; a second active layer, having a different conductivity type from the first active layer, formed on the first active layer; an active interlayer isolation layer interposed between the first active layer and the second active layer such that the first active layer is electrically isolated from the second active layer; a common source and a common drain formed on a pair of opposite side surfaces of the stacked structure; a common first gate and a common second gate formed on the other pair of opposite side surfaces of the stacked structure; a tunnel dielectric layer interposed between the first and second gates and the first and second active layers; and a charge trap layer, storing charges that tunnel through the tunnel dielectric layer, interposed between the tunnel dielectric layer and the first and second gates.