The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2009

Filed:

Jul. 12, 2007
Applicants:

Chien-li Cheng, Hsin-Chu, TW;

Chin-tien Yang, Kaohsiung County, TW;

Tzung-han Lee, Taipei, TW;

Shian-hau Liao, Tai-Chung, TW;

Chung-yuan Lee, Tao-Yuan, TW;

Inventors:

Chien-Li Cheng, Hsin-Chu, TW;

Chin-Tien Yang, Kaohsiung County, TW;

Tzung-Han Lee, Taipei, TW;

Shian-Hau Liao, Tai-Chung, TW;

Chung-Yuan Lee, Tao-Yuan, TW;

Assignee:

Nanya Technology Corp., Tao-Yuan Hsien, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
Abstract

A checkerboard deep trench dynamic random access memory cell array layout is disclosed, which includes a substrate, a plurality of gate conductor lines disposed on the substrate, a plurality of checkerboard-arranged and staggered deep trench capacitor structures embedded in the substrate under the gate conductor lines, and a plurality of active areas formed in the substrate under the gate conductor lines, alternatively arranged with the deep trench capacitor structures, and electrically connected with an adjacent deep trench capacitor structure. The width of the parts of the gate conductor lines above the deep trench capacitor structures is narrower than that of the parts of the gate conductor lines above the active areas.


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