The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2009

Filed:

Sep. 26, 2005
Applicants:

Michael Thomas Sheehan, Corpus Christi, TX (US);

Mark E. Wagman, Wilmington, DE (US);

Inventors:

Michael Thomas Sheehan, Corpus Christi, TX (US);

Mark E. Wagman, Wilmington, DE (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 226/06 (2006.01); C08F 16/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention discloses a composition consisting essentially of an E/X/M random copolymer wherein X is from 0.1 to 20 mol % of the E/X/M copolymer and is a 4-vinylphenyl ester, preferably 4-acetoxystyrene; M is from 0 to 40 mol % of the E/X/M copolymer and is one or more ethylenically unsaturated monomers; and E is ethylene. The invention further encompasses a high pressure radical polymerization process for providing the novel polymers; and a base catalyzed transesterification process for conversion of the E/X/M copolymer to an E/Y/M copolymer wherein Y is derived from 4-hydroxystyrene. Another embodiment of the invention is a composition consisting essentially of an E/Y/M random copolymer wherein Y is greater than 1.0 to about 20 mol % of the E/Y/M copolymer and is 4-hydroxystyrene; M is from 0 to 40 mol % of the E/Y/M copolymer and is one or more ethylenically unsaturated monomers; and E is ethylene.


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