The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Oct. 10, 2006
Balamurugan Subramanian, Plano, TX (US);
Balamurugan Subramanian, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
In a method and system for fabricating a full wafer () having dies, an orientation marker (), and a reference die (), includes configuring a reticle pattern () that is configured by arranging the dies in an array having m rows and n columns, where the m rows start in a row adjacent to the orientation marker (), and m and n are integers. The reticle pattern () is transferred to the full wafer () to sequentially form a portion of the dies. The transferring includes placing an inkless marker () in the form of one or more non-circuit dies between the n columns of adjacent reticle patterns. The reticle pattern () is repeatedly transferred to form a remaining portion of the dies to complete the full wafer (). A wafer map for the full wafer () is stored, with the wafer map including a non-circuit bin containing data describing the inkless marker ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile