The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Mar. 25, 2005
Marc J. Madou, Irvine, CA (US);
Chunlei Wang, Irvine, CA (US);
Lili Taherabadi, Irvine, CA (US);
Benjamin Park, Irvine, CA (US);
Rabih Zaouk, Irvine, CA (US);
Marc J. Madou, Irvine, CA (US);
Chunlei Wang, Irvine, CA (US);
Lili Taherabadi, Irvine, CA (US);
Benjamin Park, Irvine, CA (US);
Rabih Zaouk, Irvine, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
C-MEMS architecture having carbon structures with high surface areas due to high aspect ratios and nanoscale surface enhancements, and improved systems and methods for producing such structures are provided. Specifically, high aspect ratio carbon structures are microfabricated by pyrolyzing a patterned carbon precursor polymer. Pyrolysing the polymer preferably comprises a multi-step process in an atmosphere of inert and forming gas at high temperatures that trail the glass transition temperature (Tg) for the polymer. The surface area of the carbon microstructures is increases by nanotexturing the surface through oxygen plasma exposure, and by integrating nanoscale structures with the carbon microstructures by exposing the carbon microstructures and a catalyst to hydrocarbon gas. In a preferred embodiment, the carbon microstructures are the source of carbon gas.