The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2009

Filed:

Dec. 30, 2005
Applicants:

Fang Wen, Beijing, CN;

Ying-qing Xu, Beijing, CN;

Heung-yeung Shum, Beijing, CN;

David P. Vronay, Sammamish, WA (US);

Inventors:

Fang Wen, Beijing, CN;

Ying-Qing Xu, Beijing, CN;

Heung-Yeung Shum, Beijing, CN;

David P. Vronay, Sammamish, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A non-photorealistic technique is described for transforming an original image into a sketch image. The technique includes: segmenting the original image into plural regions to produce a segmented image, wherein the regions are demarcated by respective boundaries; shrinking a boundary of at least one of the plural regions in the segmented image to produce a boundary-shrunk image; and modifying at least one color in the boundary-shrunk image to produce the sketch image.


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