The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2009

Filed:

Feb. 04, 2005
Applicants:

Tatsuhiro Kobayashi, Tokyo, JP;

Koji Mishima, Tokyo, JP;

Inventors:

Tatsuhiro Kobayashi, Tokyo, JP;

Koji Mishima, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/09 (2006.01); G11B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

When a space region shorter than the radius of a beam spot is formed, pre-heating with an assist pulse is not performed, and an off pulse pattern is fixed at a base power level. When a space region longer than the radius of the beam spot and shorter than the diameter of the beam spot is formed, an assist pulse is applied to the end of the space region to be formed. The length of the assist pulse is made greater, the longer the space region to be formed. Further, when a space region longer than the diameter of the beam spot is formed, an assist pulse is applied to the end of the space region to be formed, and the length of the assist pulse is kept constant regardless of the length of the space region to be formed.


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