The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2009

Filed:

May. 31, 2005
Applicants:

Yoshitaka Yamada, Fukaya, JP;

Hirokazu Morimoto, Fukaya, JP;

Seiichi Sato, Okegawa, JP;

Hiroyuki Kimura, Fukaya, JP;

Tetsuya Iizuka, Saitama, JP;

Inventors:

Yoshitaka Yamada, Fukaya, JP;

Hirokazu Morimoto, Fukaya, JP;

Seiichi Sato, Okegawa, JP;

Hiroyuki Kimura, Fukaya, JP;

Tetsuya Iizuka, Saitama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to reduce the number of processes for manufacturing spacers and to prevent quality degradation resulting from a cell gap, a spacerin a semi-transmission areais formed outside of a region of a bump layerB. Thus, it is made possible to manufacture the spacer in the transmission regionand the spacer outside of the region of the bump layer in the same process. Accordingly, the number of processes can be reduced. Moreover, it is made possible to determine the cell gap in the semi-transmission areaby a single element of a spacer. Accordingly, precision degradation of the cell gap, which results from the bump layer, can be prevented, and high display quality can be obtained.


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