The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2009
Filed:
Sep. 23, 2004
Shuichi Okawa, Tokyo, JP;
Kazuhiro Hattori, Tokyo, JP;
Katsuyuki Nakada, Tokyo, JP;
Mitsuru Takai, Tokyo, JP;
Shuichi Okawa, Tokyo, JP;
Kazuhiro Hattori, Tokyo, JP;
Katsuyuki Nakada, Tokyo, JP;
Mitsuru Takai, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A mask forming method forms an A mask forming functional layer with an amorphous structure so as to cover an etched body, forms a B mask forming functional layer so as to cover the formed A mask forming functional layer, forms a convex/concave pattern in the formed B mask forming functional layer by carrying out a predetermined process to form a B mask on the A mask forming functional layer, and forms an A mask on the etched body by forming a convex/concave pattern in the A mask forming functional layer by dry etching the A mask forming functional layer using the B mask. By doing so, a convex/concave pattern with extremely small pattern fluctuations can be formed in the A mask forming functional layer.