Substrate processing apparatus and substrate processing system

Abstract

Of a substrate-facing surfaceof an atmosphere blocking member, a central areawhich is faced with an approximately central portion of a substrate S is a flat surface while a periphery edge areawhich is faced with a periphery edge of the substrate S is an angled surface which becomes closer to the substrate S with a distance toward a periphery edge of the substrate-facing surface. Hence, a micro-space SP between the substrate S and the atmosphere blocking memberbecomes gradually narrower in a direction R which is toward the periphery edge of the substrate S. As an atmosphere gas is fed into the micro-space SP, the atmosphere gas is compressed in the vicinity of a periphery edge of the micro-space SP and a pressure rises. As a result, the micro-space SP becomes positively pressurized as compared with a mist-splashed atmosphere, which effectively prevents a mist from invading other major surface Sof the substrate S.