The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Aug. 05, 2005
John F. Schipper, Palo Alto, CA (US);
Jing LI, San Jose, CA (US);
John F. Schipper, Palo Alto, CA (US);
Jing Li, San Jose, CA (US);
Abstract
Method and system for determining chemical composition of a single-component or multiple-component gas, using a discharge holdoff mechanism. A voltage difference V between two spaced apart electrodes is brought to a selected value and held, the holdoff time interval Δt(V;ho) required before gas discharge occurs is measured, and the associated electrical current or cumulative electrical charge is measured. As the voltage difference V increases, the time interval length Δt(V;ho) decreases monotonically. Particular voltage values, Vand V, correspond to initial appearance of discharge (Δt≈∞) and prompt discharge (Δt≈0). The values Vand Vand the rate of decrease of Δt(V;ho) and/or the rate of increase of current or cumulative charge with increasing V are characteristic of one or more gas components present.