The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Mar. 14, 2006
Yun-fei LI, Fremont, CA (US);
Hui-chuan Wang, Pleasanton, CA (US);
Chyu-jiuh Torng, Pleasanton, CA (US);
Cherng-chyi Han, San Jose, CA (US);
Mao-min Chen, San Jose, CA (US);
Yun-Fei Li, Fremont, CA (US);
Hui-Chuan Wang, Pleasanton, CA (US);
Chyu-Jiuh Torng, Pleasanton, CA (US);
Cherng-Chyi Han, San Jose, CA (US);
Mao-Min Chen, San Jose, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Although it is known that exchange bias can be utilized in abutted junctions for longitudinal stabilization, a relatively large moment is needed to pin down the sensor edges effectively. Due to the inverse dependence of the exchange bias on the magnetic layer thickness, a large exchange bias has been difficult to achieve by the prior art. This problem has been solved by introducing a structure in which the magnetic moment of the bias layer has been approximately doubled by pinning it from both above and below through exchange with antiferromagnetic layers. Additionally, since the antiferromagnetic layer is in direct abutted contact with the free layer, it acts directly to help stabilize the sensor edge, which is an advantage over the traditional magnetostatic pinning that had been used.