The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

Mar. 04, 2008
Applicants:

Lukas Novotny, Rochester, NY (US);

Filipp Ignatovich, Rochester, NY (US);

Inventors:

Lukas Novotny, Rochester, NY (US);

Filipp Ignatovich, Rochester, NY (US);

Assignee:

University of Rochester, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Light from a laser source is split into a reference arm and a detection arm. The light in the detection arm is focused into a channel containing particles to be detected and is backscattered by the particles. The light in the reference arm is attenuated. The attenuated and backscattered light are caused to interfere and detected by a split detector so that the effects of background light can be subtracted out, while the backscattered light is detected to detect the particles.


Find Patent Forward Citations

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Novotny, Lukas. (2009). Apparatus and method for sizing nanoparticles based on interferometric field detection (U.S. Patent No. 7528959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7528959

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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