The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

Nov. 27, 2006
Applicant:

Tatsuo Fukui, Tokyo, JP;

Inventor:

Tatsuo Fukui, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 9/00 (2006.01); G01B 11/14 (2006.01); G01R 31/26 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of adjusting optical imaging system is provided to finely adjust arrangement of optical elements with sensitivity. Illumination light with a predetermined wavelength band is irradiated to an adjustment mark including first marks disposed at a first pitch and second marks disposed at a second pitch different from the first pitch. An image is captured according to light, of diffracted light emitted from the adjustment mark, passing through an aperture stop and reaching an image surface of the optical imaging system. A positional deviation between the first and second marks is calculated with symmetric/asymmetric property of luminance information. Based on respective positional deviations calculated while the wavelength band of illumination light is changed, arrangement of optical elements between a pupil plane and an aperture stop surface of the optical imaging system is finely adjusted, to correct imaging positional deviation of a pupil image on the aperture stop surface.


Find Patent Forward Citations

Loading…