The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2009

Filed:

Dec. 05, 2005
Applicants:

David N. Ruzic, Sadorus, IL (US);

Brian E. Jurczyk, Champaign, IL (US);

Darren Alman, Savoy, IL (US);

Martin J. Neumann, Pekin, IL (US);

Huatan Qiu, Urbana, IL (US);

Inventors:

David N. Ruzic, Sadorus, IL (US);

Brian E. Jurczyk, Champaign, IL (US);

Darren Alman, Savoy, IL (US);

Martin J. Neumann, Pekin, IL (US);

Huatan Qiu, Urbana, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.


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