The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Jan. 24, 2008
Applicants:
Hyo-jin Yun, Anyang-si, KR;
Young-gil Kwon, Anyang-si, KR;
Young-ho Kim, Yongin-si, KR;
Do-young Kim, Seoul, KR;
Jae-hee Choi, Bucheon-si, KR;
Se-kyung Baek, Seoul, KR;
Inventors:
Hyo-Jin Yun, Anyang-si, KR;
Young-Gil Kwon, Anyang-si, KR;
Young-Ho Kim, Yongin-si, KR;
Do-Young Kim, Seoul, KR;
Jae-Hee Choi, Bucheon-si, KR;
Se-Kyung Baek, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 69/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a sulfonium-salt anionic group containing a carboxyl group as a hydrophilic site and a remainder of a solvent. The photoresist composition may form a photoresist pattern having a uniform profile.